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Volumn 4450, Issue , 2001, Pages 94-107

Absolute extreme-ultraviolet metrology

Author keywords

Extreme ultraviolet; Lithography; Metrology; Radiometry; Reflectometry; Synchrotron radiation

Indexed keywords

ASTRONOMY; ELECTROMAGNETIC WAVES; LITHOGRAPHY; OPTICAL VARIABLES MEASUREMENT; PHOTODIODES; PHYSICS; PLASMAS; RADIATION DETECTORS; RADIOMETRY; SPECTRUM ANALYSIS; SYNCHROTRON RADIATION;

EID: 0034779467     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.431244     Document Type: Conference Paper
Times cited : (9)

References (36)
  • 9
    • 0003032448 scopus 로고    scopus 로고
    • note
  • 13
    • 0002889839 scopus 로고    scopus 로고
    • note
  • 23
    • 84975555380 scopus 로고
    • New far uv detector calibration facility at the National Bureau of Standards
    • (1987) Appl. Opt. , vol.26 , Issue.18 , pp. 3831-3837
    • Canfield, L.R.1
  • 34
    • 0000515073 scopus 로고
    • Caracterisation des surfaces par reflexion rasante de rayons X. Application a l'etude du polissage de quelques verres silicates
    • (1980) Revue Phys. Appl , vol.15 , pp. 761-779
    • Nevot, L.1    Croce, P.2
  • 35
    • 0001380394 scopus 로고    scopus 로고
    • Reflectance measurements on clean surfaces for the determination of optical constants in silicon in the extreme ultraviolet-soft-x-ray region
    • (1997) Appl. Opt. , vol.36 , pp. 5499
    • Soufli, R.1    Gullikson, E.M.2
  • 36
    • 0002888561 scopus 로고    scopus 로고


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.