Comparison of optical, SEM, and AFM overlay measurement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 229-238

  Jaiprakash, V C ^a   Gould, C J ^a  

^a Siemens Microelectronics Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ATOMIC FORCE MICROSCOPY; DYNAMIC RANDOM ACCESS STORAGE; OPTICAL INSTRUMENT LENSES; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE;

ACROSS FIELD OVERLAY VARIATION (AFOV); OVERLAY METROLOGY;

PHOTOLITHOGRAPHY;

EID: 0032662134     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350810     Document Type: Conference Paper

References (0)