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Volumn 14, Issue 14, 2000, Pages 523-530
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Properties and preparation of AlN thin films by reactive laser ablation with nitrogen discharge
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINUM NITRATE;
NITROGEN;
ARTICLE;
CHEMICAL STRUCTURE;
DIELECTRIC CONSTANT;
EXCIMER LASER;
FILM;
LASER SURGERY;
REFRACTION INDEX;
SEMICONDUCTOR;
TEMPERATURE DEPENDENCE;
X RAY;
X RAY DIFFRACTION;
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EID: 0034690985
PISSN: 02179849
EISSN: None
Source Type: Journal
DOI: 10.1142/S0217984900000689 Document Type: Article |
Times cited : (8)
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References (34)
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