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Volumn , Issue , 2000, Pages 192-198

Wet etching and its application to the fabrication and characterization of AlGaN/GaN HFETs

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; GALLIUM NITRIDE; GATES (TRANSISTOR); HETEROJUNCTIONS; MOLECULAR BEAM EPITAXY; PHOTOCHEMICAL REACTIONS; SAPPHIRE; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES; SURFACE ROUGHNESS;

EID: 0034594208     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (2)

References (9)
  • 4
    • 0032472665 scopus 로고    scopus 로고
    • Smooth n-type GaN surfaces by photoenhanced wet etching
    • C. Youtsey, I. Adesida, L. T. Romano, and G. Bulman, "Smooth n-type GaN surfaces by photoenhanced wet etching," J. Appl. Phys., vol. 72, pp. 560-562, 1998.
    • (1998) J. Appl. Phys. , vol.72 , pp. 560-562
    • Youtsey, C.1    Adesida, I.2    Romano, L.T.3    Bulman, G.4
  • 7
    • 33947335915 scopus 로고
    • Flash photolysis of persulfate ions in aqueous solutions
    • L. Dogliotti and E. Hayon, "Flash photolysis of persulfate ions in aqueous solutions," J. Phys. Chem., vol. 71, pp. 2511-2516, 1967.
    • (1967) J. Phys. Chem. , vol.71 , pp. 2511-2516
    • Dogliotti, L.1    Hayon, E.2
  • 8
    • 33947454767 scopus 로고
    • The chemistry of persulfate I: The kinetics and mechanism of the decomposition of the persulfate ion in aqueous medium
    • I. M. Kolhoff and I. K. Miller, "The chemistry of persulfate I: The kinetics and mechanism of the decomposition of the persulfate ion in aqueous medium," J. Am. Chem. Soc., vol. 73, pp. 3055-3059, 1951.
    • (1951) J. Am. Chem. Soc. , vol.73 , pp. 3055-3059
    • Kolhoff, I.M.1    Miller, I.K.2
  • 9
    • 0034156416 scopus 로고    scopus 로고
    • Growth of high-performance GaN modulation-doped field-effect transistorsby ammonia-molecular-beam epitaxy
    • H. Tang, J. B. Webb, J. A. Bardwell, and T. MacElwee, "Growth of high-performance GaN modulation-doped field-effect transistorsby ammonia-molecular-beam epitaxy," J. Vac. Sci. Technol. A, vol. 18, pp. 652-655, 2000.
    • (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 652-655
    • Tang, H.1    Webb, J.B.2    Bardwell, J.A.3    MacElwee, T.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.