Channeling as a mechanism for dry etch damage in GaN

Applied Physics Letters

Volumn 76, Issue 26, 2000, Pages 3941-3943

  Haberer, Elaine D ^a   Chen, Ching Hui ^a   Abare, Amber ^a   Hansen, Monica ^a   Denbaars, Steve ^a   Coldren, Larry ^a   Mishra, Umesh ^a   Hu, Evelyn L ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000125267     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.126828     Document Type: Article

References (11)

1. C-H. Chen, D. L. Green, and E. L. Hu, J. Vac. Sci. Technol. B 13, 2355 (1995).
2. E. L. Hu, Ching-Hui Chen, and D. L. Green, J. Vac. Sci. Technol. B 14, 3632 (1996).
3. C-H. Chen and E. L. Hu, Detect Diffus. Forum 157-159, 175 (1998).
4. Z. Fan, S. N. Mohammad, W. Kim, O. Aktas, A. E. Botchkarev, and H. Morkoc, Appl. Phys. Lett. 68, 1672 (1996).
5. A. T. Ping, A. C. Schmitz, I. Adesida, M. A. Khan, Q. Chen, and J. W. Yang, J. Electron. Mater. 26, 266 (1997).
6. C. R. Eddy, Jr., MRS Internet J. Nitride Semicond. Res. 4S1, G10.5 (1999).
7. D. L. Green and E. L. Hu, J. Vac. Sci. Technol. B 11, 2249 (1993).
8. R. Germann, A. Forchel, and M. Bresch, J. Vac. Sci. Technol. B 7, 1475 (1989).
9. N. G. Stoffel, J. Vac. Sci. Technol. B 10, 651 (1992).
10. B. Hollaender, S. Mantl, M. Mayer, C. Kirchner, A. Pelzmann, M. Kamp, S. Christiansen, M. Albrecht, and H. P. Strunk, Nucl. Instrum. Methods Phys. Res. B 136-138, 1248 (1998).
11. A. Turos, L. Nowicki, A. Stonert, M. Leszczynski, I. Grzegory, and S. Porowski, Mater, Sci. Forum 248/249, 419 (1997).