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Volumn 379, Issue 1-2, 2000, Pages 101-106

Low temperature process for nano-structure formation with Si films

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; CRYSTALLIZATION; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; EVAPORATION; FILM PREPARATION; GRAIN BOUNDARIES; HEAT TREATMENT; MORPHOLOGY; NANOSTRUCTURED MATERIALS; OXIDATION; SEMICONDUCTING SILICON;

EID: 0034510627     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01551-0     Document Type: Article
Times cited : (3)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.