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Volumn 379, Issue 1-2, 2000, Pages 101-106
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Low temperature process for nano-structure formation with Si films
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL MODIFICATION;
CRYSTALLIZATION;
CURRENT VOLTAGE CHARACTERISTICS;
DEPOSITION;
EVAPORATION;
FILM PREPARATION;
GRAIN BOUNDARIES;
HEAT TREATMENT;
MORPHOLOGY;
NANOSTRUCTURED MATERIALS;
OXIDATION;
SEMICONDUCTING SILICON;
NANOSTRUCTURE FORMATIONS;
SEMICONDUCTING FILMS;
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EID: 0034510627
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(00)01551-0 Document Type: Article |
Times cited : (3)
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References (18)
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