Properties of low residual stress silicon oxynitrides used as a sacrificial layer

Materials Research Society Symposium - Proceedings

Volumn 605, Issue , 2000, Pages 49-54

  Habermehl, S ^a   Glenzinski, A K ^a   Halliburton, W M ^a   Sniegowski, J J ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROMACHINING; NITROGEN; POLYCRYSTALLINE MATERIALS; RESIDUAL STRESSES; SILICA; SILICON WAFERS; SURFACE TREATMENT;

MICROELECTRICAL MECHANICAL SYSTEMS; SILICON OXYNITRIDES;

SILICON COMPOUNDS;

EID: 0034505204     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)

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