Stress relaxation in Si-rich silicon nitride thin films

Journal of Applied Physics

Volumn 83, Issue 9, 1998, Pages 4672-4677

  Habermehl, S ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010123339     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367253     Document Type: Article

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