Regional density functional theory for crystal growth in GaN

Journal of Crystal Growth

Volumn 221, Issue 1-4, 2000, Pages 765-771

  Nakamura, Koichi ^a   Hayashi, Tensei ^a   Tachibana, Akitomo ^a   Matsumoto, Koh ^b  

^a KYOTO UNIVERSITY   (Japan)

^b TAIYO NIPPON SANSO CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; ELECTRONIC PROPERTIES; MOLECULAR ORIENTATION; NITRIDES; PROBABILITY DENSITY FUNCTION;

GALLIUM NITRIDE;

SEMICONDUCTING GALLIUM COMPOUNDS;

EID: 0034497248     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(00)00813-7     Document Type: Article

References (21)

1. S. Nakamura, Acta Phys. Pol. A 95 (1999) 153; and references therein.
2. I. Akasaki, H. Amano, Jpn. J. Appl. Phys. 36 (1997) 5393; and references therein.
3. Uchida K., Tokunaga H., Inashi Y., Akutsu N., Matsumoto K. Mater. Res. Soc. Symp. Proc. 449:1997;129.
4. Thon A., Kuech T.F. Appl. Phys. Lett. 69:1996;55.
5. Chen C.H., Liu H., Steigerwald D., Imler W., Kuo C.P., Ludowise M., Lester S., Amano J. J. Electron Mater. 25:1996;1004.
6. Noad J.P., SpringThorpe A.J. J. Electron Mater. 9:1980;601.
7. Bass S.J., Pickering C., Young M.L. J. Crystal Growth. 64:1983;68.
8. Kuo C.P., Yuan J.S., Cohen R.M., Dunn J., Stringfellow G.B. Appl. Phys. Lett. 44:1984;550.
9. Zywietz T., Neugebauer J., Scheffler M. Appl. Phys. Lett. 73:1998;487.
10. Neugebauer J., Zywietz T., Scheffler M., Northrup J.E., Van de Walle C.G. Phys. Rev. Lett. 80:1998;3097.
11. Northrup J.E., Romano L.T., Neugebauer J. Appl. Phys. Lett. 74:1999;2319.
12. Tachibana A. Int. J. Quant. Chem. Symp. 21:1987;181.
13. Tachibana A., Parr R.G. Int. J. Quant. Chem. 41:1992;527.
14. Tachibana A. Int. J. Quant. Chem. 57:1996;423.
15. Tachibana A. Theor. Chem. Acc. 102:1999;188.
16. Tachibana A., Nakamura K. J. Am. Chem. Soc. 117:1995;3605.
17. Tachibana A., Kawauchi S., Nakamura K., Inaba H. Int. J. Quant. Chem. 57:1996;673.
18. Tachibana A., Nakamura K., Sakata K., Morisaki T. Int. J. Quant. Chem. 74:1999;669.
19. Kleinman L., Bylander D.M. Phys. Rev. Lett. 48:1982;1425.
20. Perdew J.P., Wang Y. Phys. Rev. B. 45:1992;13244.
21. Perdew J.P., Chevary J.A., Vosko S.H., Jackson K.A., Pederson M.A., Singh D.J., Fiolhais C. Phys. Rev. B. 46:1992;6671.