Hydrogen plasma pretreatment effect on the deposition of aluminum thin films from metalorganic chemical vapor deposition using dimethylethylamine alane

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 3, 1999, Pages 1031-1035

  Jang, Tae Woong ^a   Rhee, Hwa Sung ^a   Ahn, Byung Tae ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3943057537     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581678     Document Type: Article

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