Tunable Fabry-Perot cavities

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4230, Issue , 2000, Pages 198-209

  Winchester, K ^a   Spaargaren, S M R ^a   Dell, J M ^a  

^a UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

Author keywords

Fabry Perot Cavity; MEMS; Microcavity; Silicon Nitride Membrane

Indexed keywords

CAVITY RESONATORS; MICROMACHINING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; THIN FILMS;

FABRY-PEROT (FP) CAVITIES;

MICROELECTROMECHANICAL DEVICES;

EID: 0034452611     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.404904     Document Type: Conference Paper

References (14)

1. LPCVD against PECVD for micromechanical applications
2. Optimization of a low-stress silicon nitride process for surface-micromachining applications
3. Influence of deposition temperature, gas pressure, gas phase composition, and RF frequency on composition and mechanical stress of plasma silicon nitride layers
4. The preparation, characterization and application of plasma-enhanced chemically vapour deposited silicon nitride films deposited at low temperatures
5. Real time measurement of epilayer strain using a simplified wafer curvature technique
6. HF/H/sub 2/O vapor etching of SiO/sub 2/ sacrificial layer for large-area surface-micromachined membranes [optical modulator fabrication]
7. Silicon dioxide sacrificial layer etching in surface micromachining
8. Transferable silicon nitride microcavities
9. The use of ZnS as a sacrificial layer in the construction of a Fabry-Perot cavity
10. Comparative study of various release methods for polysilicon surface micromachining
11. Long-wavelength resonant vertical-cavity LED/photodetector with a 75-nm tuning range