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Volumn 31, Issue 7, 2000, Pages 523-529

Transferable silicon nitride microcavities

Author keywords

Micro electro mechanical systems; Microcavities; Silicon nitride

Indexed keywords


EID: 0005321754     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0026-2692(00)00025-2     Document Type: Article
Times cited : (6)

References (11)
  • 4
    • 0026202935 scopus 로고
    • The preparation, characterization and application of plasma-enhanced chemically vapour deposited silicon nitride films deposited at low temperatures
    • J.M. Lee, K. Sooriakumar, M.M. Dange, The preparation, characterization and application of plasma-enhanced chemically vapour deposited silicon nitride films deposited at low temperatures, Thin Solid Films 203 (2) (1991) 275-287.
    • (1991) Thin Solid Films , vol.203 , Issue.2 , pp. 275-287
    • Lee, J.M.1    Sooriakumar, K.2    Dange, M.M.3
  • 6
    • 0022046041 scopus 로고
    • Influence of deposition temperature, gas pressure, gas phase composition, and RF frequency on composition and mechanical stress of plasma silicon nitride layers
    • W.A.P. Claassen, W. Valkenburg, M.F.C. Willemsen, W.M. van de Wijgert, Influence of deposition temperature, gas pressure, gas phase composition, and RF frequency on composition and mechanical stress of plasma silicon nitride layers, Journal of the Electrochemical Society 132 (4) (1985) 893-899.
    • (1985) Journal of the Electrochemical Society , vol.132 , Issue.4 , pp. 893-899
    • Claassen, W.A.P.1    Valkenburg, W.2    Willemsen, M.F.C.3    Van De Wijgert, W.M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.