Oxidation resistance of TaSiN diffusion barriers

Integrated Ferroelectrics

Volumn 31, Issue 1-4, 2000, Pages 315-322

  Letendu, F ^a   Hugon, M C ^a   Desvignes, J M ^a   Agius, B ^a   Vickridge, I ^a   Kim, D J ^a   Kingon, A I ^a  

^a UNIV PARIS SUD   (France)

Author keywords

18O; Conductive Diffusion Barrier; Oxidation; TaSiN

Indexed keywords

COMPUTER SIMULATION; DIFFUSION COATINGS; ELECTRIC CONDUCTIVITY; FERROELECTRIC MATERIALS; NUCLEAR PROPERTIES; OXIDATION RESISTANCE; PERMITTIVITY; RAPID THERMAL ANNEALING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DIFFUSION BARRIERS; FILM COMPOSITIONS; INTEGRATION OF FERROELECTRICS; NUCLEAR REACTION ANALYSIS;

TANTALUM COMPOUNDS;

EID: 0034448661     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584580008215664     Document Type: Conference Paper

References (6)