Top surface imaging for extreme ultraviolet lithography

Journal of Photopolymer Science and Technology

Volumn 11, Issue 3, 1998, Pages 459-464

  Henderson, Craig ^a   Wheeler, David ^a,b   Pollagi, Timothy ^a,b   Cardinale, Greg ^a   O'Connell, Donna ^a   Fisher, Aaron ^a   Rao, Veena ^a,c   Goldsmith, John ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b Intel Corporation MS SC1 03 ^*  (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Dimethylaminodimethyldisilane; Extreme ultraviolet lithography; Thin layer imaging; Top surface imaging

Indexed keywords

EID: 0001370606     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.459     Document Type: Article

References (14)

1. C. G. Willson in Introduction to Microlithography, L.F. Thompson, C. G. Willson, and M. J. Bowdcn, cds., 2nd edition, American Chemical Society, Washington, D.C. (1994), 239-251.
2. E. Reichmanis in Polymers for Electronic and Photonis Applications, C. P. Wong, ed., Academic Press, Inc., San Diego (1993), 67-119.
3. G. N. Taylor, L. E. Stillwagon, and T. Venkatesan, J. Electrochem, Soc. 131 (1984), 1658. 4 T. M. Wolf, G. N. Taylor, T. Venkatesan, and R. T. Kretsch, J. Electrochem. Soc. 131 (1984), 1664. 5. M. A. Hartney, M. Rothschild, R. R. Kunz, D. J. Ehrlich, and D. C. Shaver, J. Vac. Sei. Technol. B 8 (1990), 1476.
4. F. Coopmans and B. Roland, Solid State Technol. 30(6) (1987), 93.
5. S. A. MacDonald, H. Ito, H. Hiraoka, and G. C. Willson, Proc. Reg. Tech. Conf. on Photopolymers,
6. Prin., P r oc. and Mat., Mid-Hudson Section SPE, Ellenville, New York (1985), 87.
7. C. G. Willson, S. A. MacDonald, H. Ito, J. M. J. Frcchet, Polymers for Microlithography, Kodansha, Tokoyo(1990),3-18.
8. R. Sezi, R. Lcuschner, M. Sebald, H. Ahne, S. Birkle,andH. Bömdorfer, Microelectronic Engng. 11(1990), 535.
9. W. M. Mansfield, 0. R. Wood II, R. D. D'Souza, and A. Ncureuther, OSA Proceedings Scries 12 (1991), 129.
10. D. R. Wheeler, G. Kubiak, A. Ray-Chaudhuri, and C. Henderson, OSA TOPS on Extreme Ultraviolet Lithography 4 (1996), 33.
11. G. N. Taylor, R. S. Hutton, D. L. Windt, and W. M. Mansfield, SPIE Proceedings 1343 (1990), 258.
12. C. Hcndcrson, D. Wheeler, T. PollagL D. O'Connell, J. Goldsmith, A. Fisher, G. Cardinale, J. Hutchinson, and V. Rao, SPIE Proceedings 3331 (l998) to be published.
13. R. S. Hutton, G. N. Taylor, and D. R. Wheeler, U.S. patent 5,487,967.
14. M. Irmscher, B. Hofflinger, R. Springer, C. Stauffer, and W. Peterson, J. Photopolym. Sei. Tech. 9(3) (1996), 497.