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Volumn 609, Issue , 2000, Pages
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Doping of amorphous and microcrystalline silicon films by hot-wire CVD and RFPECVD at low substrate temperatures on plastic substrates
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC CONDUCTIVITY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYETHYLENE TEREPHTHALATES;
RAMAN SPECTROSCOPY;
SEMICONDUCTOR DOPING;
SUBSTRATES;
THERMAL EFFECTS;
THIN FILMS;
TRANSPORT PROPERTIES;
HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);
MICROCRYSTALLINE SILICON FILMS;
AMORPHOUS SILICON;
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EID: 0034428426
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-609-a22.6 Document Type: Conference Paper |
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Times cited : (7)
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References (11)
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