The properties of reactively-sputtered, stoichiometry-controlled and optimum-conductivity transparent indium oxide films as a function of their titanium, aluminium and zinc content; comparisons with the use of tin as a dopant

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 115-118

  Safi, I ^a   Howson, R P ^a  

^a LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

Indium oxide; Indium tin oxide; Optical coatings; Reaction kinetics; Sputtering

Indexed keywords

ALUMINUM; COMPOSITION EFFECTS; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; INDIUM COMPOUNDS; OPTICAL COATINGS; OPTICAL FILMS; SPUTTER DEPOSITION; STOICHIOMETRY; TIN; TITANIUM; ZINC;

INDIUM OXIDE; REACTIVE SPUTTERING;

CONDUCTIVE FILMS;

EID: 0032623412     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01625-3     Document Type: Article

References (5)

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2. G. Frank, E. Kauer, H. Kostlin, Thin Solid Films 77 (1981) 107.
3. I. Hamberg, C.G. Granqvist, J. Appl. Phys. 60 (11) (1986) R123.
4. M.I. Ridge, R.P. Howson, Thin Solid Films 96 (1982) 121.
5. R.P. Howson. Multicomponent and Multilayered Thin Films for Advanced Microtechnologies, in: O. Auciello, J. Engemann (Eds.), Techniques, Fundamentals And Devices, Kluwer Academic Publishers, Netherlands, 1993, pp. 239-249.