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Applied Physics A: Materials Science and Processing

Volumn 69, Issue 7, 1999, Pages

Characterisation of combined positive-negative photoresists by excimer laser ablation

(6) Wei, J a Hoogen, N b Lippert, T a Hahn, Ch a Nuyken, O b Wokaun, A a

a PAUL SCHERRER INSTITUTE (Switzerland)

b TECHNICAL UNIVERSITY OF MUNICH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21444436951 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390051545 Document Type: Article

Times cited : (8)

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