Polymer resist materials for excimer ablation lithography

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 905-910

  Suzuki, Kenkichi ^a   Matsuda, Masaaki ^a   Hayashi, Nobuaki ^a  

^a HITACHI LTD   (Japan)

Author keywords

Excimer ablation lithography; Polymer; Polyurethane; Resist

Indexed keywords

EXCIMER LASERS; LASER ABLATION; LIQUID CRYSTAL DISPLAYS; POLYURETHANES; THIN FILM TRANSISTORS;

EXCIMER ABLATION LITHOGRAPHY (EAL);

PHOTORESISTS;

EID: 0032070463     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00108-1     Document Type: Article

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