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Advanced Materials

Volumn 10, Issue 10, 1998, Pages 786-789

Photochemical properties of poly(arylazophosphonates)

(3) Kunz, Thilo a Hahn, Christina a Wokaun, Alexander a,b

a PAUL SCHERRER INSTITUTE (Switzerland)

b ETH ZURICH (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; LASER ABLATION; LITHOGRAPHY; MOLECULAR STRUCTURE; NITROGEN COMPOUNDS; PHOTOLYSIS; REACTION KINETICS;

EXCIMER LASER ABLATION LITHOGRAPHY (EAL); POLYARYLAZOPHOSPHONATES;

AROMATIC POLYMERS;

EID: 0032499832 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/(SICI)1521-4095(199807)10:10<786::AID-ADMA786>3.0.CO;2-7 Document Type: Article

Times cited : (11)

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