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Volumn 36, Issue 8, 1997, Pages 5361-5364

Positive-negative inversion of silicon based resist materials: Poly(di-n-hexylsilane) for ion beam irradiation

Author keywords

Gel; Ion beam; Negative resist; PDHS; Polysilane; Positive resist; Sol

Indexed keywords

POLYHEXYLSILANES; POSITIVE NEGATIVE INVERSION;

EID: 0031212856     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.5361     Document Type: Article
Times cited : (22)

References (35)
  • 13
    • 0021542552 scopus 로고
    • American Chemical Society, Washington DC
    • M. J. Bowden: ACS Symposium Series (American Chemical Society, Washington DC, 1984) Vol. 266, p. 39.
    • (1984) ACS Symposium Series , vol.266 , pp. 39
    • Bowden, M.J.1
  • 18
    • 0004219204 scopus 로고
    • American Chemical Society, Washington DC
    • R. D. Miller: Advanced in Chemistry Series (American Chemical Society, Washington DC, 1990) Vol. 224, p. 413.
    • (1990) Advanced in Chemistry Series , vol.224 , pp. 413
    • Miller, R.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.