Chromium aluminum oxide films for ArF line high transmittance attenuated phase shifting mask application

Optical Engineering

Volumn 39, Issue 11, 2000, Pages 2947-2955

  Kim, Eunah ^a   Moon, Seong Yong ^b   Kim, Yong Hoon ^b   Yoon, Hee Sun ^b   No, Kwangsoo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; COMPUTER SIMULATION; MASKS; MATHEMATICAL MODELS; MATRIX ALGEBRA; OPTICAL FILMS; OPTIMIZATION; PHASE SHIFT; PHOTORESISTS;

CHROMIUM ALUMINUM OXIDE FILM; PHASE SHIFTING MASKS; SUBMICROMETER;

LITHOGRAPHY;

EID: 0034316499     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1312648     Document Type: Article

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