Design of 200 nm, 170 nm, 140 nm DUV contact sweeper high transmission attenuating phase shift mask through simulation - Part 1

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 617-641

  Socha, Robert J ^a   Petersen, John S ^a   Chen, Fung ^a   Laidig, Tom ^a   Wampler, Kurt ^a   Caldwell, Roger ^a  

^a NATIONAL SEMICONDUCTOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; INTEGRATED CIRCUIT LAYOUT; OPTICAL RESOLVING POWER; PHASE SHIFTERS; PHOTORESISTS; VECTORS;

CONTACT HOLE MASKS;

MASKS;

EID: 0032295006     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)