Attenuated phase-shifting masks of chromium aluminum oxide

Applied Optics

Volumn 37, Issue 19, 1998, Pages 4254-4259

  Kim, Eunah ^a   Hong, Seungbum ^a   Lim, Sungchul ^b   Kim, Yong Beom ^b   Woo, Sang Gyun ^b   Kim, Dae Weon ^a   No, Kwangsoo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001022708     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.37.004254     Document Type: Article

References (20)

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