Simulation and fabrication of attenuated phase-shifting masks: CrFx

Applied Optics

Volumn 36, Issue 28, 1997, Pages 7247-7256

  Kim, Eunah ^a   Hong, Seungbum ^a   Kim, Kyong Sub ^a   Jiang, Zhong Tao ^a   Kim, Dae Weon ^a   Lim, Sungchul ^b   Woo, Sang Gyun ^b   Koh, Young Bum ^b   No, Kwangsoo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Attenuated type; Chromium fluoride; Phase shifting mask

Indexed keywords

EID: 0001018337     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.36.007247     Document Type: Article

References (12)

1. M. D. Levenson, N. S. Viswanathan, and R. A. Simpson, “Improving resolution in photolithography with a phase-shifting mask,” IEEE Trans. Electron Devices ED-29, 1828-1836 (1982).
2. N. Hayashi, Micro Products Research Laboratory, Micro Products Division, Dai Nippon Printing Company, Ltd. 2-2-1 Fukuoka, Kamifukuoka, Saitama 356, Japan (personal communication, 1996).
3. S. Ito, H. Hazama, T. Kamo, H. Miyazaki, H. Sato, K. Hayashi, H. Shigemitsu, and I. Mori, “Optimization of optical properties for single-layer halftone masks,” in Optical/Laser Microlithography VII, T. A. Brunner, ed., Proc. SPIE 2197, 99-110 (1994).
4. H. Tanabe, J. Ushioda, and U. Seki, “Chromium fluoride attenuated phase-shift mask for ArF excimer laser lithography,” in Proceedings of Second International Symposium on 193nm Lithography (Sematech, Colorado Springs, Colo., 1996), pp. 89-90.
5. L. F. Thompson, C. Grant Willson, and M. J. Bowden, Introduction to Microlithography, 2nd ed. (American Chemical Society, Washington, D.C., 1994), pp. 78-81.
6. B. J. Lin, “The attenuated phase-shifting mask,” Solid State Technol. 42-47 (January 1992).
7. M. Bass, Handbook of Optics, 2nd ed. (McGraw-Hill, New York, 1995), Chap. 42.3.
8. S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood, Handbook of Plasma Processing Technology (Noyes Publications, Park Ridge, N.J., 1990), Chap. 9.
9. S. Hong, E. Kim, Z.-T. Jiang, K. No, S.-C. Lim, S.-G. Woo, and Y.-B. Koh, “Effects of gas ring position and mesh introduction on film quality and thickness uniformity,” Mat. Sci. Eng. B 45 (1-3), 98-101 (1997).
10. Z.-F. Zhou and Y.-D. Fan, “Stress and stress anisotropy in Co-Cr magnetic thin films deposited by magnetron sputtering,” Thin Solid Films 272, 43-48 (1996).
11. A. E. Ennos, “Stresses developed in optical film coatings,” Appl. Opt. 5, 51-61 (1996).
12. B. M. Mahan and R. J. Myers, University Chemistry, 4th ed. (Benjamin/Cummings, Menlo Park, Calif., 1975), pp. 661-664.