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Volumn 39, Issue 11, 2000, Pages 6196-6201
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Spectroscopic ellipsometry studies on ultrathin hydrogenated amorphous silicon films prepared by thermal chemical vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
CHEMICAL VAPOR DEPOSITION;
ELLIPSOMETRY;
HYDROGENATION;
MORPHOLOGY;
SPECTROSCOPIC ANALYSIS;
ULTRATHIN FILMS;
SPECTROSCOPIC ELLIPSOMETRY;
THERMAL CHEMICAL VAPOR DEPOSITION;
AMORPHOUS FILMS;
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EID: 0034316180
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.39.6196 Document Type: Article |
Times cited : (6)
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References (19)
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