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Volumn 29, Issue 10, 2000, Pages 717-720

Surface recession of silicon under normally incident oxygen bombardment studied by atomic force microscopy of microscale sputtered craters

(3) Wittmaack, K a Strigl, M a Horwarth, A b

a INSTITUTE OF EPIDEMIOLOGY (Germany)

b Atomika Instruments (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; ION IMPLANTATION; OXYGEN; SILICA; SURFACE TREATMENT;

OXYGEN BOMBARDMENT; SPUTTERED CRATERS; SURFACE RECESSION;

SEMICONDUCTING SILICON;

EID: 0034299628 PISSN: 01422421 EISSN: None Source Type: Journal
DOI: 10.1002/1096-9918(200010)29:10<717::AID-SIA912>3.0.CO;2-L Document Type: Article

Times cited : (6)

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