Migration-adsorption mechanism of metallic impurities out of chemically amplified photoresist onto silicon-based substrates

Journal of the Electrochemical Society

Volumn 147, Issue 10, 2000, Pages 3853-3858

  Yang, Chin Cheng ^a   Ko, Fu Hsiang ^a   Wang, Mei Ya ^b   Wang, Tien Ko ^b   Wu, Shich Chuan ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; BARIUM; CESIUM; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; IMPURITIES; LITHOGRAPHY; MANGANESE; MATHEMATICAL MODELS; RADIOACTIVE TRACERS; SEMICONDUCTING SILICON; ZINC;

CHEMICALLY AMPLIFIED PHOTORESIST; METALLIC IMPURITIES; MIGRATION;

PHOTORESISTS;

EID: 0034294450     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393985     Document Type: Article

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