Real-time on-wafer evaluation of contaminant-induced defects from resist processing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 206-216

  Lowell, John K ^a   Ackmann, Paul W ^a   Brown, Stuart E ^a   Sherry, Julia ^a   Hossain, Tim ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINANT-INDUCED DEFECTS; SURFACE RECOMBINATION;

CHARGE CARRIERS; CONTAMINATION; DEFECTS; INTERFACES (MATERIALS); METALS; NONDESTRUCTIVE EXAMINATION; PHOTORESISTS; PROCESS CONTROL; REAL TIME SYSTEMS; SURFACES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0029771912     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)