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Electrochimica Acta

Volumn 45, Issue 28, 2000, Pages 4629-4633

Is there a limit for the passivation of Si surfaces during anodic oxidation in acidic NH4F solutions?

(4) Rappich, J a Timoshenko, V Yu b,c Wurz R a Dittrich, Th c

a HAHN MEITNER INSTITUT (Germany)

b MOSCOW STATE UNIVERSITY (Russian Federation)

c TECHNICAL UNIVERSITY OF MUNICH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; HYDROGENATION; INTERFACES (MATERIALS); PASSIVATION; PHOTOLUMINESCENCE; SILICA; STRAIN; SURFACE ROUGHNESS;

AMMONIUM FLUORIDE;

SEMICONDUCTING SILICON;

EID: 0034290804 PISSN: 00134686 EISSN: None Source Type: Journal
DOI: 10.1016/S0013-4686(00)00614-9 Document Type: Article

Times cited : (12)

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