Fabrication of Coulomb blockade devices by combination of high resolution Electron Beam Lithography and deposition of granular films

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 563-566

  Mejias, M ^a   Lebreton, C ^a   Vieu, C ^a   Pepin A ^a   Carcenac, F ^a   Launois, H ^a   Boero, M ^b  

^a CNRS   (France)

^b UNIVERSITY OF EXETER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON BEAMS; FABRICATION; FILMS; GOLD; LITHOGRAPHY; SEMICONDUCTING SILICON; SUBSTRATES;

COULOMB BLOCKADE DEVICES; GRANULAR FILMS;

NANOTECHNOLOGY;

EID: 0031683742     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00132-4     Document Type: Article

References (8)

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