Sub-10 nm monogranular metallic lines formed by 200 kV electron-beam lithography and lift-off in polymethylmethacrylate resist

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 253-256

  Vieu, C ^a   Mejias, M ^a   Carcenac, F ^a   Faini, G ^a   Launois, H ^a  

^a Lab Microstructures Microlectron   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; ELECTRON DEVICES; GOLD; GRANULAR MATERIALS; METALLIC FILMS; NANOTECHNOLOGY; POLYMETHYL METHACRYLATES;

GOLD FILM; LIFT OFF TECHNIQUE; SINGLE ELECTRON DEVICE;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031071159     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00109-8     Document Type: Article

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