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Volumn 15, Issue 3, 1997, Pages 659-663

Diagnosing SiO2 contact etch stop with optical emission

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0004458464     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580701     Document Type: Article
Times cited : (8)

References (15)
  • 3
    • 0001197855 scopus 로고
    • D. J. Vitkavage, A. Kornblit, R. A. Nichols, D. P. Favreu, and S. McNevin, Tegal Plasma Proceedings Symposium, San Francisco (1991) (unpublished); reprinted in R. A. Gottscho, C. W. Jurgensen, and D. J. Vitkavage, J. Vac. Sci. Technol. B 10, 2133 (1992).
    • (1992) J. Vac. Sci. Technol. B , vol.10 , pp. 2133
    • Gottscho, R.A.1    Jurgensen, C.W.2    Vitkavage, D.J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.