Adhesion of polysilicon microbeams in controlled humidity ambients

Materials Research Society Symposium - Proceedings

Volumn 518, Issue , 1998, Pages 131-136

  de Boer, M P ^a   Clews, P J ^a   Smith, B K ^a   Michalske, T A ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; DRYING; ELASTICITY; HUMIDITY CONTROL; MATHEMATICAL MODELS; MECHANICAL VARIABLES MEASUREMENT; MICROMACHINING; NUMERICAL METHODS; PLASTIC DEFORMATION; SEMICONDUCTING SILICON; SURFACE TREATMENT;

KELVIN EQUATION; POLYSILICON MICROBEAMS; SUPERCRITICAL CARBON DIOXIDE DRYING;

MICROELECTROMECHANICAL DEVICES;

EID: 0032304155     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-518-131     Document Type: Conference Paper

References (26)