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Volumn 21, Issue 8, 2000, Pages 408-410
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Impact of cobalt silicidation on the low-frequency noise behavior of shallow p-n junctions
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Author keywords
[No Author keywords available]
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Indexed keywords
COBALT;
CURRENT VOLTAGE CHARACTERISTICS;
SEMICONDUCTING SILICON;
SUBSTRATES;
SILICIDATION;
SEMICONDUCTOR JUNCTIONS;
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EID: 0034246456
PISSN: 07413106
EISSN: None
Source Type: Journal
DOI: 10.1109/55.852966 Document Type: Article |
Times cited : (11)
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References (12)
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