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Volumn 50, Issue 3, 2000, Pages 299-315

Growth of silicon-germanium alloy layers

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; FILM GROWTH; GERMANIUM; HYDROGENATION; METALLORGANIC VAPOR PHASE EPITAXY; MOLECULAR BEAM EPITAXY; SEMICONDUCTING FILMS;

EID: 0034229929     PISSN: 0011748X     EISSN: None     Source Type: Journal    
DOI: 10.14429/dsj.50.3719     Document Type: Article
Times cited : (10)

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