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Volumn 180, Issue 1, 2000, Pages 73-79
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Morphology of GaN surfaces and GaN/(Al, Ga)N interfaces grown on 6H-SiC(0001) by reactive molecular beam epitaxy
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
INTERFACES (MATERIALS);
MOLECULAR BEAM EPITAXY;
MORPHOLOGY;
OPTICAL PROPERTIES;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
SEMICONDUCTOR GROWTH;
SEMICONDUCTOR QUANTUM WELLS;
SILICON CARBIDE;
SURFACE ROUGHNESS;
SURFACES;
TRANSMISSION ELECTRON MICROSCOPY;
BROADENING EFFECT;
GALLIUM NITRIDE;
INTERFACE ROUGHNESS;
SPIRAL GROWTH;
SEMICONDUCTING GALLIUM COMPOUNDS;
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EID: 0034229278
PISSN: 00318965
EISSN: None
Source Type: Journal
DOI: 10.1002/1521-396X(200007)180:1<73::AID-PSSA73>3.0.CO;2-B Document Type: Article |
Times cited : (9)
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References (11)
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