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Volumn 369, Issue 1, 2000, Pages 25-28
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Ge thin film growth on Si(111) surface using hydrogen surfactant
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Author keywords
[No Author keywords available]
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Indexed keywords
HYDROGEN;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING GERMANIUM;
SEMICONDUCTING SILICON;
SPECTROSCOPIC ANALYSIS;
SUBSTRATES;
SURFACE ACTIVE AGENTS;
THIN FILMS;
COAXIAL IMPACT-COLLISION ION SCATTERING SPECTROSCOPY (CAICISS);
ION SCATTERING SPECTROSCOPY;
TIME-OF-FLIGHT ELASTIC RECOIL DETECTION ANALYSIS (TOF-ERDA);
SEMICONDUCTING FILMS;
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EID: 0034227464
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(00)00828-2 Document Type: Article |
Times cited : (11)
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References (21)
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