Effect of HCl catalyst in the formation of flat structures of Ta2O5 thin films by sol-gel technique

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 II, 2000, Pages 1561-1566

  Cantalini, C ^a   Pelino, M ^a   Phani, R A ^b,c   Passacantando, M ^b   Picozzi, P ^b   Santucci, S ^b  

^a Dept of Chemistry and Materials ^*  (Italy)

^b INFM   (Italy)

^c Univ of New Hampshire   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CATALYST ACTIVITY; CRYSTALLIZATION; FILM PREPARATION; HYDROCHLORIC ACID; MORPHOLOGY; SEMICONDUCTING SILICON; SOL-GELS; SURFACE STRUCTURE; TANTALUM COMPOUNDS; THERMAL EFFECTS; THIN FILMS;

SOL-GEL SPIN COATING; TANTALUM PENTOXIDE;

DIELECTRIC FILMS;

EID: 0034224323     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582385     Document Type: Article

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