메뉴 건너뛰기




Volumn 53, Issue 1, 2000, Pages 77-84

Soft x-rays for deep sub-100 nm lithography, with and without masks

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; MASKS; MICROELECTROMECHANICAL DEVICES; MONOLITHIC MICROWAVE INTEGRATED CIRCUITS; OPTICAL COMMUNICATION; QUANTUM ELECTRONICS; SEMICONDUCTOR DEVICES; X RAYS;

EID: 0034206981     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00269-0     Document Type: Article
Times cited : (8)

References (35)
  • 4
    • 0038769252 scopus 로고    scopus 로고
    • 4. J. P. Silverman, J. Vac. Sci. Technol. B 15, (1997) 2177; J. P. Silverman, A White Paper for the 1998 Sematech Next Generation Lithography Workshop.
    • (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 2177
    • Silverman, J.P.1
  • 20
    • 0001346385 scopus 로고    scopus 로고
    • Ph.D. Thesis MIT
    • 18. D. J. D. Carter, A. Pepin, M. R. Schweizer and H. I. Smith, J. Vac. Sci. Technol. B, 15, (1997) 2509; D.J.D. Carter, Ph.D. Thesis MIT (1998).
    • (1998)
    • Carter, D.J.D.1
  • 23
    • 0007041808 scopus 로고    scopus 로고
    • Ph.D. Thesis, MIT
    • 21. J. Ferrera, Ph.D. Thesis, MIT (1999).
    • (1999)
    • Ferrera, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.