Effect of applied potential on the chemical mechanical polishing of aluminum in phosphoric acid base slurry

Journal of the Electrochemical Society

Volumn 147, Issue 6, 2000, Pages 2136-2142

  Kuo, Hong Shi ^a   Tsai, Wen Ta ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASION; ALUMINUM; ANODIC POLARIZATION; AUGER ELECTRON SPECTROSCOPY; CHEMICAL POLISHING; CORROSION; CURRENT DENSITY; PASSIVATION; PHOSPHORIC ACID; PRESSURE MEASUREMENT;

CHEMICAL MECHANICAL POLISHING; POTENTIODYNAMIC POLARIZATION CURVE MEASUREMENT;

ELECTROCHEMISTRY;

EID: 0034205661     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393498     Document Type: Article

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