Preparation of epitaxial V2O3 films on C-, A- and R-planes of α-Al2O3 substrates by coating-pyrolysis process

Thin Solid Films

Volumn 366, Issue 1-2, 2000, Pages 294-301

  Yamaguchi, I ^a   Manabe, T ^a   Kumagai, T ^a   Kondo, W ^a   Mizuta, S ^a  

^a NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CRYSTAL ORIENTATION; CRYSTALLIZATION; EPITAXIAL GROWTH; FILM PREPARATION; GRAIN GROWTH; HEAT TREATMENT; INTERFACES (MATERIALS); PYROLYSIS; SUBSTRATES; VANADIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

RHOMBOHEDRAL CORUNDUM STRUCTURE; VANADIUM OXIDE;

THIN FILMS;

EID: 0034188426     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00740-9     Document Type: Article

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