Preparation of epitaxial Pb(Zr, Ti)O3 thin films on Nb-doped SrTiO3 (100) substrates by dipping-pyrolysis process

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 8, 1997, Pages 5221-5225

  Hwang, Kyu Seog ^a,b   Manabe, Takaaki ^a   Yamaguchi, Iwao ^a   Kumagai, Toshiya ^a   Mizuta, Susumu ^a  

^a NATL INST OF MAT AND CHEM RES   (Japan)

^b Chonnam National University   (South Korea)

Author keywords

Dipping pyrolysis process; Metal naphthenates; Nb doped SrTiO3; PZT thin films; Reciprocal space mapping

Indexed keywords

DIPPING PYROLYSIS PROCESS; METAL NAPHTHENATES; RECIPROCAL SPACE MAPPING;

CRYSTAL ORIENTATION; DOPING (ADDITIVES); EPITAXIAL GROWTH; FERROELECTRIC MATERIALS; HEAT TREATMENT; PYROLYSIS; STRONTIUM COMPOUNDS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 0031212811     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.5221     Document Type: Article

References (16)

1. C. M. Foster, G.-R. Bai, Z. Li, R. Jammy, L. A. Wills and R. Hiskes: Epitaxial Oxide Thin Films II, eds. J. S. Speck, D. K. Fork, R. M. Wolf and T. Shiosaki (Materials Research Society, Pittsburgh, 1996) Vol. 401, p. 139.
2. M. Shimizu and T. Shiosaki: Epitaxial Oxide Thin Films II, eds. J. S. Speck, D. K. Fork, R. M. Wolf and T. Shiosaki (Materials Research Society, Pittsburgh, 1996) Vol. 401, p. 129.
3. M. de Keijser, J. F. M. Cillessen, R. B. F. Janssen, A. E. M. De Veirman and D. M. de Leeuw: J. Appl. Phys. 79 (1996) 393.
4. R. Takayama and Y. Tomita: J. Appl. Phys. 65 (1989) 1666.
5. B. A. Tuttle, J. A. Voigt, D. C. Goodnow, D. L. Lamppa, T. J. Headley, M. O. Eatough, G. Zender, R. D. Nasby and S. M. Rodgers: J. Am. Ceram. Soc. 76 (1993) 1537.
6. Y. Liu and P. P. Phulé: J. Am. Ceram. Soc. 79 (1996) 495.
7. K. Nashimoto, D. K. Fork and G. B. Anderson: Appl. Phys. Lett. 66 (1995) 822.
8. K. Nashimoto and S. Nakamura: Jpn. J. Appl. Phys. 33 (1994) 5147.
9. A. E. M. De Veirman, J. F. M. Cillessen, M. De Keijser, R. M. Wolf, D. J. Taylor, A. A. Staals and G. J. M. Dormans: Epitaxial Oxide Thin Films II, eds. J. S. Speck, D. K. Fork, R. M. Wolf and T. Shiosaki (Materials Research Society, Pittsburgh, 1996) Vol. 401, p. 329.
10. V. E. Wood, J. R. Busch, S. D. Ramamurthi and S. L. Swartz: J. Appl. Phys. 71 (1992) 4557.
11. R. R. Neurgaonkar, I. S. Santha, J. R. Oliver, J. G. Nelson, J. T. Cheung, P. E. D. Morgan and K. R. Udayakumar: Mater. Res. Bull. 28 (1993) 719.
12. W. Braun, B. S. Kwak, A. Erbil, J. D. Budai and B. J. Wilkens: Appl. Phys. Lett. 63 (1993) 467.
13. S. Okamura, A. Kakimi and T. Tsukamoto: J. Ceram. Soc. Jpn. 103 (1995) 202.
14. B. Jaffe, W. R. Cook Jr. and H. Jaffe: Piezoelectric Ceramics (Academic Press, New York, 1971) p. 135.
15. S. Kim, T. Manabe, I. Yamaguchi, T. Kumagai and S. Mizuta: J. Mater. Res. 12 (1997) 1141.
16. H. Tabata, O. Murata, T. Kawai, S. Kawai and M. Okuyama: Jpn. J. Appl. Phys. 32 (1993) 5611.