Preparation and characterization of V2O3 powder and film

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12, 1998, Pages 6519-6523

  Piao, Jinshun ^a   Takahashi, Seiji ^a   Kohiki, Shigemi ^a  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

AFI M transition; Resistivity; Sol gel method; V2O3 film

Indexed keywords

ANTIFERROMAGNETISM; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM PREPARATION; POWDERS; REDUCTION; SOL-GELS; STRAIN; SUBSTRATES; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION ANALYSIS;

ANTIFERROMAGNETIC INSULATOR-METAL TRANSITION; VANADIUM OXIDE;

VANADIUM COMPOUNDS;

EID: 0032303319     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6519     Document Type: Article

References (10)

1. H. Kuwamoto, N. M. Honig and J. Appel: Phys. Rev. B 22 (1980) 2626.
2. A. Ruegg, R. S. Perkins and P. Streit: Sci. Ceram. 11 (1981) 559.
3. W. Chen, Q. Xu and W. Q. Cui: J. Mater. Sci. 32 (1997) 1049.
4. K. D. Rogers, J. A. Coath and M. C. Lovell: J. Appl. Phys. 70 (1991) 1412.
5. D. P. Partlow, S. R. Gurkovich, K. C. Radford and L. J. Denes: J. Appl. Phys. 70 (1991) 443.
6. J. Piao and M. Kuwabara: J. Ceram. Soc. Jpn. 105 (1997) 573.
7. J. Mendialdua, R. Casanova and Y. Barbaux: J. Electron Spectrosc. & Relat. Phenom. 71 (1995) 249.
8. H. R. Kokabi and F. Studer: J. Appl. Phys. 80 (1996) 5646.
9. S. A. Shivashankar and J. M. Honig: Phys. Rev. 28 (1983) 5695.
10. K. Nagasawa, Y. Bando and T. Takada: J. Cryst. Growth 17 (1972) 143.