Micro-Raman analysis of the effects of post-silicidation thermal treatments on C54 TiSi2 formation in confined areas

Solid State Communications

Volumn 109, Issue 3, 1998, Pages 141-143

  Quilici, S ^a   Meinardi, F ^a   Sabbadini, A ^b  

^a UNIVERSITY OF MILAN   (Italy)

^b STMICROELECTRONICS   (Italy)

Author keywords

A. Metals; D. Phase transitions; E. Inelastic light scattering

Indexed keywords

ANNEALING; LIGHT SCATTERING; MICROANALYSIS; PHASE TRANSITIONS; TITANIUM COMPOUNDS;

INELASTIC LIGHT SCATTERING; MICRO-RAMAN ANALYSIS; SILICIDATION; TITANIUM SILICIDE;

SEMICONDUCTING FILMS;

EID: 0032315690     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1098(98)00537-7     Document Type: Article

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