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Volumn 44, Issue 2, 2000, Pages 325-340

Comparing SiC switching power devices: MOSFET, NPN transistor and GTO thyristor

Author keywords

[No Author keywords available]

Indexed keywords

BIPOLAR TRANSISTORS; CARRIER CONCENTRATION; COMPUTER SIMULATION; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; DIFFUSION IN SOLIDS; ELECTRIC BREAKDOWN OF SOLIDS; MOSFET DEVICES; SEMICONDUCTING SILICON COMPOUNDS; SWITCHING CIRCUITS; THYRISTORS; TRANSCONDUCTANCE;

EID: 0034140439     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(99)00239-7     Document Type: Article
Times cited : (52)

References (15)
  • 1
    • 0024749835 scopus 로고
    • Power semiconductor device figure of merit for high frequency applications
    • Baliga B.J. Power semiconductor device figure of merit for high frequency applications. IEEE Electron Device Letters. 10:1989;455-457.
    • (1989) IEEE Electron Device Letters , vol.10 , pp. 455-457
    • Baliga, B.J.1
  • 9
    • 0003547182 scopus 로고    scopus 로고
    • Palo Alto, CA: TMA Inc
    • MEDICI user's manual. 1998;TMA Inc, Palo Alto, CA.
    • (1998) MEDICI User's Manual
  • 10
    • 0001054523 scopus 로고
    • Site effect on the impurity levels in 4H, 6H, and 15R SiC
    • Ikeda M., Matsunami H., Tanaka T. Site effect on the impurity levels in 4H, 6H, and 15R SiC. Physical Review B. 22:1980;2842-2854.
    • (1980) Physical Review B , vol.22 , pp. 2842-2854
    • Ikeda, M.1    Matsunami, H.2    Tanaka, T.3
  • 12
    • 21544461610 scopus 로고
    • Large-band-gap SiC, III-V nitride, and II-VI ZnSe-based semiconductor device technologies
    • Morkoc H., Strite S., Gao G.B., Lin M.E., Sverdlov B., Burns M. Large-band-gap SiC, III-V nitride, and II-VI ZnSe-based semiconductor device technologies. J. Appl. Phys. 76:1994;1363-1398.
    • (1994) J. Appl. Phys. , vol.76 , pp. 1363-1398
    • Morkoc, H.1    Strite, S.2    Gao, G.B.3    Lin, M.E.4    Sverdlov, B.5    Burns, M.6
  • 13
    • 0020087475 scopus 로고
    • Electron and hole mobilities in silicon as a function of concentration and temperature
    • Arora N.D., Hauser J.R., Roulston D.J. Electron and hole mobilities in silicon as a function of concentration and temperature. IEEE Trans. Electron Devices. 29:1982;292-295.
    • (1982) IEEE Trans. Electron Devices , vol.29 , pp. 292-295
    • Arora, N.D.1    Hauser, J.R.2    Roulston, D.J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.