X-ray photoelectron spectroscopy study of carbon nitride films

Surface and Coatings Technology

Volumn 125, Issue 1-3, 2000, Pages 313-316

  Krastev, V ^a   Petrov, P ^b   Dimitrov, D ^c   Beshkov, G ^c   Georgiev, Ch ^b   Nedkov, I ^b  

^a INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY   (Bulgaria)

^b INSTITUTE OF ELECTRONICS   (Bulgaria)

^c INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

Carbon nitride; Electron beam evaporation; Ion bombardment; X ray photoelectron spectroscopy

Indexed keywords

CARBON NITRIDE; CHEMICAL BOND; COATING PROCESS; ELECTRODE; FILM; IONIZATION; REACTION TIME; SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON INORGANIC COMPOUNDS; CHEMICAL BONDS; ELECTRON BEAMS; EVAPORATION; FILM GROWTH; ION BOMBARDMENT; NANOSTRUCTURED MATERIALS; NITRIDES; PROTECTIVE COATINGS; SPUTTERING; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; ELECTRON BEAM EVAPORATION; NANOCLUSTERS;

AMORPHOUS FILMS;

CARBONITRIDING; ELECTRON BEAM TECHNIQUE; FILM;

EID: 0034054584     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00583-6     Document Type: Conference Paper

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