XPS study of plasma treated carbon layers deposited on porous silicon

Materials Science and Engineering B

Volumn B56, Issue 1, 1998, Pages 1-4

  Beshkov, G ^a   Krastev, V ^b   Velchev, N ^c   Marinova, Ts ^b  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY   (Bulgaria)

^c UNIVERSITY OF PLOVDIV   (Bulgaria)

Author keywords

Carbon film; Nitrogen plasma; Porous silicon; XPS

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; PLASMAS; POROUS SILICON; SILICON WAFERS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA TREATED CARBON LAYERS;

SEMICONDUCTING FILMS;

EID: 0037540326     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5107(98)00214-1     Document Type: Article

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