Crystallization of amorphous Si films for thin film solar cells

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 2, 1998, Pages 925-929

  Wohllebe, A ^a   Carius, R ^a   Houben, L ^a   Klatt, A ^a   Hapke, P ^a   Klomfass J ^a   Wagner, H ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Amorphous Si films; Crystallization; Thin film solar cells

Indexed keywords

ABSORPTION; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; LASER PULSES; NEODYMIUM LASERS; RAMAN SPECTROSCOPY; SILICON SOLAR CELLS; THIN FILM DEVICES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

AMORPHOUS FILMS;

EID: 0032066846     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00201-4     Document Type: Article

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