-
1
-
-
35949025938
-
-
et al., Discrete resistance switching in submicrometer silicon inversion layers: Individual interface traps and low-frequency (I//?) noise, vol. 52, p. 228, 1984.
-
K. S. Rails et al., "Discrete resistance switching in submicrometer silicon inversion layers: Individual interface traps and low-frequency (I//?) noise," Phys. Rev. Lett., vol. 52, p. 228, 1984.
-
Phys. Rev. Lett.
-
-
Rails, K.S.1
-
2
-
-
0012278046
-
-
Noise in solid-state microstructures: A new perspective on individual defects, interface states, and low-frequency noise, vol. 38, p. 367, 1989.
-
M. J. Kirton and M. J. Uren, "Noise in solid-state microstructures: A new perspective on individual defects, interface states, and low-frequency noise," Adv. Phys., vol. 38, p. 367, 1989.
-
Adv. Phys.
-
-
Kirton, M.J.1
Uren, M.J.2
-
3
-
-
0026170313
-
-
Hot-electron-induced traps studied through the random telegraph noise, vol. 12, p. 273, 1991.
-
P. Fang, K. K. Hung, P. K. Ko, and C. Hu, "Hot-electron-induced traps studied through the random telegraph noise," IEEE Electron. Device Lett., vol. 12, p. 273, 1991.
-
IEEE Electron. Device Lett.
-
-
Fang, P.1
Hung, K.K.2
Ko, P.K.3
Hu, C.4
-
4
-
-
0028463791
-
-
Random telegraph signals in deep submicron n-MOSFET's, vol. 41, p. 1161, 1994.
-
Z. Shi, J. P. Mieville, and M. Dutoit, "Random telegraph signals in deep submicron n-MOSFET's," IEEE Tran. Electron Devices, vol. 41, p. 1161, 1994.
-
IEEE Tran. Electron Devices
-
-
Shi, Z.1
Mieville, J.P.2
Dutoit, M.3
-
5
-
-
0025383482
-
-
Random telegraph noise of deep-submicrometer MOSFET's, vol. 11, p. 90, 1990.
-
K. K. Hung, P. K. Ko, C. Hu, and Y. C. Cheng, "Random telegraph noise of deep-submicrometer MOSFET's," IEEE Electron Device Lett., vol. 11, p. 90, 1990.
-
IEEE Electron Device Lett.
-
-
Hung, K.K.1
Ko, P.K.2
Hu, C.3
Cheng, Y.C.4
-
6
-
-
0026821932
-
-
Explaining the amplitude of RTS noise in submicrometer MOSFET's,/£££ vol. 39, p. 422, 1992.
-
E. Simoen, B. Dierickx, C. E. Claeys, and G. J. Declerck, "Explaining the amplitude of RTS noise in submicrometer MOSFET's,"/£££ Trans. Electron Devices, vol. 39, p. 422, 1992.
-
Trans. Electron Devices
-
-
Simoen, E.1
Dierickx, B.2
Claeys, C.E.3
Declerck, G.J.4
-
7
-
-
0028533096
-
-
Parameter extraction and 1/f noise in a surface and bulk-type, p-channel EDD MOSFET, vol. 37, p. 1853, 1994.
-
X. Ei, C. Barros, E. P. Vandamme, and E. K. J. Vandamme, "Parameter extraction and 1/f noise in a surface and bulk-type, p-channel EDD MOSFET," Solid-State Electron., vol. 37, p. 1853, 1994.
-
Solid-State Electron.
-
-
Ei, X.1
Barros, C.2
Vandamme, E.P.3
Vandamme, E.K.J.4
-
8
-
-
84876791937
-
-
Individual oxide traps as probes into submicron devices, vol. 5, p. 1862, 1988.
-
P. Restle, "Individual oxide traps as probes into submicron devices," Appl. Phys. Lett., vol. 5, p. 1862, 1988.
-
Appl. Phys. Lett.
-
-
Restle, P.1
-
9
-
-
0025403817
-
-
Internal probing of submicron FETs and photoemission using individual oxide traps, vol. 34, p. 227, 1990.
-
P. Restle and A. Gnudi, "Internal probing of submicron FETs and photoemission using individual oxide traps," IBM J. Res. Develop., vol. 34, p. 227, 1990.
-
IBM J. Res. Develop.
-
-
Restle, P.1
Gnudi, A.2
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