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Surface and Coatings Technology

Volumn 100-101, Issue 1-3, 1998, Pages 295-299

Oxidation and structural changes in fcc TiNx thin films studied with X-ray reflectivity

(3) Logothetidis, S a Stergioudis, G a Patsalas, P a

a ARISTOTLE UNIVERSITY OF THESSALONIKI (Greece)

Author keywords

Magnetron sputtering; Oxidation; TiN; X ray reflectivity

Indexed keywords

DENSITY MEASUREMENT (SPECIFIC GRAVITY); ELLIPSOMETRY; FILM GROWTH; MAGNETRON SPUTTERING; OXIDATION; STOICHIOMETRY; SURFACE ROUGHNESS; THIN FILMS; TITANIUM NITRIDE;

FACE CENTERED CUBIC STRUCTURE; X RAY REFLECTIVITY;

CERAMIC COATINGS;

EID: 0032027447 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(97)00636-1 Document Type: Article

Times cited : (18)

References (16)

1
- 0002021077
- J.E. Sundgren, Thin Solid Films 128 (1985) 45.
- (1985) Thin Solid Films , vol.128 , pp. 45
- Sundgren, J.E.¹

2
- 0024586889
- E.I. Meletis, J. Mater. Engng 11 (1989) 159.
- (1989) J. Mater. Engng , vol.11 , pp. 159
- Meletis, E.I.¹

3
- 36449004206
- W. Li, X. He, H. Li, J. Appl. Phys. 75 (1994) 2002.
- (1994) J. Appl. Phys. , vol.75 , pp. 2002
- Li, W.¹ He, X.² Li, H.³

4
- 0006376693
- L.C. Zang, S.K. Cheung, C.L. Liang, N.W. Cheung, Appl. Phys. Lett. 50 (1987) 445.
- (1987) Appl. Phys. Lett. , vol.50 , pp. 445
- Zang, L.C.¹ Cheung, S.K.² Liang, C.L.³ Cheung, N.W.⁴

5
- 0019576438
- W. Cheung, H. von Seefeld, M.A. Nicolet, F. Ho, P. Iles, J. Appl. Phys. 52 (1981) 4297.
- (1981) J. Appl. Phys. , vol.52 , pp. 4297
- Cheung, W.¹ Von Seefeld, H.² Nicolet, M.A.³ Ho, F.⁴ Iles, P.⁵

6
- 0025505426
- H.Z. Wu, T.C. Chou, A. Mishra, D.R. Anderson, J.K. Lampert, S.C. Gujrathi, Thin Solid Films 191 (1990) 55.
- (1990) Thin Solid Films , vol.191 , pp. 55
- Wu, H.Z.¹ Chou, T.C.² Mishra, A.³ Anderson, D.R.⁴ Lampert, J.K.⁵ Gujrathi, S.C.⁶

7
- 36449003873
- H.G. Tompkins, J. Appl. Phys. 70 (1991) 3876.
- (1991) J. Appl. Phys. , vol.70 , pp. 3876
- Tompkins, H.G.¹

8
- 0001229366
- H.G. Tompkins, J. Appl. Phys. 71 (1992) 980.
- (1992) J. Appl. Phys. , vol.71 , pp. 980
- Tompkins, H.G.¹

9
- 0001631042
- C.A. Lucas, T.D. Nguyen, J.B. Kortright, Appl. Phys. Lett. 59 (1991) 2100.
- (1991) Appl. Phys. Lett. , vol.59 , pp. 2100
- Lucas, C.A.¹ Nguyen, T.D.² Kortright, J.B.³

10
- 36549094659
- M.F. Toney, S. Brennan, J. Appl. Phys. 66 (1989) 1861.
- (1989) J. Appl. Phys. , vol.66 , pp. 1861
- Toney, M.F.¹ Brennan, S.²

11
- 0000898291
- Y. Huai, R.W. Cochrane, M. Sutton, Phys. Rev. B48 (1993) 2568.
- (1993) Phys. Rev. B , vol.48 , pp. 2568
- Huai, Y.¹ Cochrane, R.W.² Sutton, M.³

12
- 0041948627
- J.V. Gilfrich et al. (Eds.), Plenum Press, New York
- T.C. Huang, R. Gilles, G. Will, in: J.V. Gilfrich et al. (Eds.), Advances in X-ray Analysis, vol. 37, Plenum Press, New York, 1994, p. 183.
- (1994) Advances in X-ray Analysis , vol.37 , pp. 183
- Huang, T.C.¹ Gilles, R.² Will, G.³

13
- 0029406317
- N. Pecz, Frangis, S. Logothetidis, I. Alexandrou, P. Barna, J. Stoemenos, Thin Solid Films 268 (1995) 57.
- (1995) Thin Solid Films , vol.268 , pp. 57
- Pecz, N.¹ Frangis² Logothetidis, S.³ Alexandrou, I.⁴ Barna, P.⁵ Stoemenos, J.⁶

14
- 0030729222
- S. Logothetidis, A. Barborica, Microelectron. Engng 33 (1997) 309.
- (1997) Microelectron. Engng , vol.33 , pp. 309
- Logothetidis, S.¹ Barborica, A.²

15
- 36549092017
- S. Logothetidis, J. Appl. Phys. 65 (1989) 2416.
- (1989) J. Appl. Phys. , vol.65 , pp. 2416
- Logothetidis, S.¹

16
- 0343019461
- in press
- S. Logothetidis, E.I. Meletis, G. Stergioudis, A.A. Adjaottor, Thin Solid Films, in press.
- Thin Solid Films
- Logothetidis, S.¹ Meletis, E.I.² Stergioudis, G.³ Adjaottor, A.A.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.